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Synthesis and characterization of dense Gd2Ti2O7 pyrochlore thin films deposited using RF magnetron sputtering

机译:稠密Gd2Ti2O7烧绿石薄膜的合成与表征   使用RF磁控溅射沉积

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摘要

Thin films of phase pure pyrochlore Gd2Ti2O7 have been synthesized by RFmagnetron sputtering. The films were prepared from oxide targets in 50%O2/Aratmosphere and deposited on 111 YSZ substrates at a temperature of 800C. Thepyrochlore structure was confirmed via grazing angle x-ray diffraction andselected area electron diffraction (SAED). TEM analysis also showed that thefilms were dense and of uniform thickness with surface roughness ofapproximately 8nm. The total conductivity measured with AC impedancespectroscopy was found to be independent of thickness and comparable inmagnitude to that of bulk Gd2Ti2O7. Differences were observed in the Arrheniusbehavior between the bulk and thin film samples and are attributed to varyinglevels of background impurities.
机译:通过射频磁控溅射合成了相纯的烧绿石Gd2Ti2O7薄膜。该膜由在50%O 2 /大气中的氧化物靶制备,并在800℃的温度下沉积在111个YSZ衬底上。通过掠角X射线衍射和选择区域电子衍射(SAED)确认了烧绿石的结构。 TEM分析还表明,该薄膜致密且厚度均匀,表面粗糙度约为8nm。发现用交流阻抗谱法测量的总电导率与厚度无关,并且与块状Gd2Ti2O7相当。在大块样品和薄膜样品之间观察到了Arrhenius行为的差异,这归因于背景杂质水平的变化。

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